• DocumentCode
    3691272
  • Title

    Optical measurements of heat treated silica samples

  • Author

    F. Mazzocchi;T. Scherer;R. Saavedra;P. Martin Martinez

  • Author_Institution
    Karlsruhe Institute of Technology, 76344, Eggenstein Leopoldshafen (GER)
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    In the following article the measurements performed at CIEMAT on several silica samples are described. The samples were treated in both N2 and O2 atmosphere, in a temperature range from 500 to 1000°C. The measurements include UV - VIS - NIR absorption spectroscopy, FT-IR transmission and reflectance spectroscopy, and visual inspection of the treated samples with a confocal microscope.
  • Keywords
    "Annealing","Silicon compounds","Atmospheric measurements","Reflectivity","Temperature measurement","Atmosphere","Microscopy"
  • Publisher
    ieee
  • Conference_Titel
    Infrared, Millimeter, and Terahertz waves (IRMMW-THz), 2015 40th International Conference on
  • ISSN
    2162-2027
  • Electronic_ISBN
    2162-2035
  • Type

    conf

  • DOI
    10.1109/IRMMW-THz.2015.7327424
  • Filename
    7327424