• DocumentCode
    3691595
  • Title

    Comparison of different models for arsenic activation in HgCdTe

  • Author

    X. H. Zhou;Y. Huang;X. S. Chen;W. Lu

  • Author_Institution
    National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of, Sciences, Shanghai 200083, China
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Arsenic doping of HgCdTe has proved problematic. Two-step anneals are usually required to activate the dopant. The model frequently used to explain p-type doping with arsenic requests an amphoteric nature of group V atoms in the II-VI lattice. This requires that group VI substitution with arsenic only occurs under mercury-rich conditions either during growth or the subsequent annealing, and includes site transferring of the As. However, there are inconsistencies in the amphoteric model and unexplained experimental observations. A new model, based on defect-mediated diffusion of the arsenic, is therefore proposed.
  • Keywords
    "Arsenic","II-VI semiconductor materials","Cadmium compounds","Molecular beam epitaxial growth","Semiconductor process modeling","Annealing"
  • Publisher
    ieee
  • Conference_Titel
    Infrared, Millimeter, and Terahertz waves (IRMMW-THz), 2015 40th International Conference on
  • ISSN
    2162-2027
  • Electronic_ISBN
    2162-2035
  • Type

    conf

  • DOI
    10.1109/IRMMW-THz.2015.7327811
  • Filename
    7327811