DocumentCode :
3692307
Title :
The study of the anomalous thermomechanical effect of fluorine-doped silicon dioxide (FSG) films using temperature dependent FTIR measurements
Author :
Matthias Knapp;Philipp Jäger;Werner Ruile;Matthias Honal;Ingo Bleyl;Leonhard M. Reindl
Author_Institution :
TDK Corporation, Munich, Germany
fYear :
2015
Firstpage :
1
Lastpage :
4
Abstract :
Fluorine-doped silicon dioxide (FSG) is a material of interest in surface acoustic wave (SAW) technology due to its anomalous thermomechanical behavior. Therefore, it can be used in SAW devices for improved temperature compensation compared to undoped SiO2. However, up to now there is still no generally accepted theory, which explains this phenomenon. We investigate the reason for its anomalous thermomechanical behavior using Fourier transform infrared spectroscopy (FTIR) measurements of a fluorine-doped silicon dioxide thin films with about 3.4 at.% of fluorine at different temperatures. Geometrical interpretations of the FTIR measurements reveal that the decreasing intertetrahedral Si-O-Si bond angle θ with increasing temperature overcompensates the increasing Si-O bond length, which results in a very low thermal expansion coefficient. The fluorine doping of SiO2 leads to an increase in the bond angle and therefore a less dense network.
Keywords :
"Temperature measurement","Atomic measurements","Force","Silicon compounds","Temperature dependence","Thermal expansion","Silicon"
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium (IUS), 2015 IEEE International
Type :
conf
DOI :
10.1109/ULTSYM.2015.0112
Filename :
7329297
Link To Document :
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