DocumentCode :
3694839
Title :
Systematic evaluation of SOI Buried Oxide reliability for partially depleted and fully depleted applications
Author :
W. Schwarzenbach;C. Malaquin;F. Allibert;G. Besnard;B.-Y. Nguyen
Author_Institution :
SOITEC, Parc Technologique des Fontaines, 38190 Bernin, France
fYear :
2015
Firstpage :
1
Lastpage :
3
Abstract :
SOI Buried Oxide (BOX) electrical quality is assessed through Charge to Breakdown, Breakdown Voltage, low field leakage, BOX fixed charge density and BOX/Si interface trap density measurements. Breakdown electrical field higher than 10 MV.cm−1 and 10 years lifetime at operating voltages in excess of 16V are reported on thin BOX layers.
Keywords :
"Electric breakdown","Silicon-on-insulator","Substrates","Current measurement","Voltage measurement","Density measurement","Leakage currents"
Publisher :
ieee
Conference_Titel :
SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2015 IEEE
Type :
conf
DOI :
10.1109/S3S.2015.7333496
Filename :
7333496
Link To Document :
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