DocumentCode
3694846
Title
Enhanced low voltage digital & analog mixed-signal with 28nm FDSOI technology
Author
F. Arnaud
Author_Institution
STMicroelectronics, 850, rue Jean Monnet, 38926 Crolles, France
fYear
2015
Firstpage
1
Lastpage
4
Abstract
This paper presents superior CMOS behavior in the field of low voltage and analog thanks to Fully Depleted Silicon On Insulator (FDSOI) used for 28nm technology. Performance and total power are improved by +100% and −200% versus regular bulk solution, respectively. Dispersion at low voltage is discussed evidencing 2x reduction thanks to efficient Forward Body Bias (FBB). Finally, key analog metrics such as gm, output voltage gain and matching factor enhancement are demonstrated.
Keywords
"Low voltage","Transistors","Logic gates","Degradation","Electrostatics","CMOS integrated circuits","Wireless communication"
Publisher
ieee
Conference_Titel
SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2015 IEEE
Type
conf
DOI
10.1109/S3S.2015.7333503
Filename
7333503
Link To Document