DocumentCode :
3694876
Title :
SiGe-on-insulator symmetric lateral bipolar transistors
Author :
J.-B. Yau;J. Cai;J. Yoon;C. D´emic;K. K. Chan;T. H. Ning;S. U. Engelmann;D.-G. Park;R. T. Mo
Author_Institution :
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY 10598
fYear :
2015
Firstpage :
1
Lastpage :
2
Abstract :
We report the first demonstration of thin-base symmetric lateral NPN bipolar transistors built on 8-inch SiGe-on-insulator (SiGe-OI) wafers with CMOS-like process. Such devices achieve the same collector current as the SOI bipolar transistor at ∼130 mV lower VBE from effective bandgap lowering, translating into lower voltage operation and power dissipation. Various techniques of Emitter engineering were studied and a novel partial HBT device structure was demonstrated with 3x reduction of hole injection into the emitter.
Keywords :
"Bipolar transistors","Silicon","Silicon germanium","Silicon-on-insulator","Photonic band gap","CMOS integrated circuits","Spontaneous emission"
Publisher :
ieee
Conference_Titel :
SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2015 IEEE
Type :
conf
DOI :
10.1109/S3S.2015.7333533
Filename :
7333533
Link To Document :
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