DocumentCode :
3694888
Title :
Experimental study on quantum mechanical effect for insensitivity of threshold voltage against temperature variation in strained SOI MOSFETs
Author :
Chang-Hoon Jeon;Byung-Hyun Lee;Byung Chul Jang;Sung-Yool Choi;Yang-Kyu Choi
Author_Institution :
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, Republic of Korea
fYear :
2015
Firstpage :
1
Lastpage :
3
Abstract :
The temperature dependence of threshold voltage (VT) in a thin-body MOSFET, which was built on a strained silicon-on-insulator (sSOI) wafer, is examined in a temperature range of 173 K to 373 K. The insensitive temperature dependency of threshold voltage (VT) is attributed to the strain effect arisen from the sSOI, which makes the energy quantization stronger due to the lowered conductivity mass. Additionally, enhanced mobility of 770 cm2/V•sec at room temperature is achieved due to the strain effect.
Keywords :
"Threshold voltage","Temperature dependence","MOSFET","Temperature distribution","Strain","Logic gates","Silicon-on-insulator"
Publisher :
ieee
Conference_Titel :
SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2015 IEEE
Type :
conf
DOI :
10.1109/S3S.2015.7333545
Filename :
7333545
Link To Document :
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