Title :
Surface structure study and structure determination of (√3 × √3)R 30° phase of Si-adsorption on Ni(111) by LEED
Author :
Md. Sazzadur Rahman;Mohammad Tawheed Kibria;Takeshi Nakagawa;Seigi Mizuno
Author_Institution :
Dept. of Molecular and Material Sciences, Kyushu University, Fukuoka, Japan
fDate :
6/1/2015 12:00:00 AM
Abstract :
The phase evolution of Si on Ni (111) was studied by LEED and AES. A new phase of Si on Ni (111) was found along with the previously reported (√3 × √3)R 30° phase. The surface structure of (√3 × √3)R 30° phase had determined, with chemical composition of Ni2Si, by using low-energy electron diffraction (LEED) analysis. The obtained nickel silicide would be helpful for understanding the formation of Schottky barrier at semiconductor-metal interface.
Keywords :
"Nickel","Silicon","Annealing","Surface structures","Atomic layer deposition","Silicides"
Conference_Titel :
Informatics, Electronics & Vision (ICIEV), 2015 International Conference on
DOI :
10.1109/ICIEV.2015.7334025
