• DocumentCode
    3695882
  • Title

    New precision wafer bonding technologies for 3DIC

  • Author

    Isao Sugaya;Hajime Mitsuishi;Hidehiro Maeda;Kazuya Okamoto

  • Author_Institution
    Nikon Corporation, Nagaodai-cho 471, Sakae-ku, Yokohama, Kanagawa 244-8533, Japan
  • fYear
    2015
  • Abstract
    A new precision wafer-to-wafer (W2W) bonding system for three-dimensional integrated circuits (3DICs) fabrication including a new precision alignment methodology and a unique thermocompression bonding procedure is proposed. Experimental results show that the alignment capability is 100 nm or better, and permanent bonding accuracy of 260 nm (|mean| + 3σ) in 300 mm Cu wafer bonding. An analysis of overlay error components is useful for identifying the causes of the error and improving the tool conditions. These capabilities are key enablers for the future of cost-effective 3DIC manufacturing.
  • Keywords
    "Silicon","Heating","Temperature measurement","Manufacturing","Aluminum nitride","III-V semiconductor materials"
  • Publisher
    ieee
  • Conference_Titel
    3D Systems Integration Conference (3DIC), 2015 International
  • Type

    conf

  • DOI
    10.1109/3DIC.2015.7334575
  • Filename
    7334575