Title :
A simple fabrication process for SiNx/SiO2 waveguide based on sidewall oxidation of patterned silicon substrate
Author :
Ya´nan Wang; Jian Wang; Changzheng Sun; Bing Xiong; Yi Luo; Zhibiao Hao; Yanjun Han; Lai Wang; Hongtao Li
Author_Institution :
Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics, China
fDate :
6/1/2015 12:00:00 AM
Abstract :
Novel fabrication process of SiNx/SiO2 waveguide based on sidewall oxidation of patterned silicon substrate is proposed. The fabrication time of the lower SiO2 cladding is about one third of that of the conventional process.
Keywords :
"Oxidation","Optical waveguides","Silicon","Substrates","Optical device fabrication","Scattering"
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2015
Electronic_ISBN :
2166-8892
DOI :
10.1109/OECC.2015.7340155
