• DocumentCode
    3699719
  • Title

    A simple fabrication process for SiNx/SiO2 waveguide based on sidewall oxidation of patterned silicon substrate

  • Author

    Ya´nan Wang; Jian Wang; Changzheng Sun; Bing Xiong; Yi Luo; Zhibiao Hao; Yanjun Han; Lai Wang; Hongtao Li

  • Author_Institution
    Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics, China
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Novel fabrication process of SiNx/SiO2 waveguide based on sidewall oxidation of patterned silicon substrate is proposed. The fabrication time of the lower SiO2 cladding is about one third of that of the conventional process.
  • Keywords
    "Oxidation","Optical waveguides","Silicon","Substrates","Optical device fabrication","Scattering"
  • Publisher
    ieee
  • Conference_Titel
    Opto-Electronics and Communications Conference (OECC), 2015
  • Electronic_ISBN
    2166-8892
  • Type

    conf

  • DOI
    10.1109/OECC.2015.7340155
  • Filename
    7340155
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3699719