Title :
A 300mm Si photonics platform for multi-applications
Author :
Tohru Mogami;Tsuyoshi Horikawa;Keizo Kinoshita;Hironori Sasaki;Ken Morito;Kazuhiko Kurata
Author_Institution :
Photonics Electronics Technology Research Association (PETRA), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
fDate :
6/1/2015 12:00:00 AM
Abstract :
A 300mm Si photonics platform has been established for optical multi-applications. For device fabrication process, the advanced CMOS technology can lead to the performance improvement of optical devices. State-of-the-art propagation loss values are obtained for optical waveguides of multi-thickness SOI structures in this platform and discussed them theoretically. 50×50mm2 large Si interposers with photonics electronics convergence technology were demonstrated by using this platform.
Keywords :
"Optical waveguides","Optical device fabrication","Optical filters","Optical crosstalk","Silicon","Photonics","Optical polarization"
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2015
Electronic_ISBN :
2166-8892
DOI :
10.1109/OECC.2015.7340291
