DocumentCode :
3699916
Title :
Optimizing the vertical profile of SiGe HBTs to mitigate radiation-induced upsets
Author :
Zachary E. Fleetwood;Brian R. Wier;Uppili S. Raghunathan;Nelson E. Lourenco;Michael A. Oakley;Alvin J. Joseph;John D. Cressler
Author_Institution :
School of Electrical and Computer Eng., 777 Atlantic Drive, NW, Georgia Tech, Atlanta, GA 30332-0250 USA
fYear :
2015
Firstpage :
72
Lastpage :
75
Abstract :
Profile optimization techniques are investigated for silicon-germanium heterojunction bipolar transistors (SiGe HBTs) intended for inverse-mode (IM) operation. IM device operation, also known as inverse active, involves electrically swapping the emitter and collector terminals and has been shown to improve the radiation tolerance of SiGe HBTs to single event transients (SETs). Multiple profile design variations are explored and trade-offs are analyzed with support of TCAD simulation. Modest design variations show marked improvement on IM performance while having minor impact on forward-mode (normal active) operation.
Keywords :
"Doping","Silicon germanium","Frequency modulation","Heterojunction bipolar transistors","Germanium","Performance evaluation","Junctions"
Publisher :
ieee
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting - BCTM, 2015 IEEE
Type :
conf
DOI :
10.1109/BCTM.2015.7340576
Filename :
7340576
Link To Document :
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