DocumentCode :
3699926
Title :
Experimental and theoretical study of fT for SiGe HBTs with a scaled vertical doping profile
Author :
J. Korn;H. Rücker;B. Heinemann;A. Pawlak;G. Wedel;M. Schröter
Author_Institution :
IHP, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
fYear :
2015
Firstpage :
117
Lastpage :
120
Abstract :
The high frequency behavior of SiGe HBTs with a vertical doping profile tailored for high transit frequencies fT was investigated experimentally and theoretically for a series of layout configurations. For ft and fmax best values of 430 GHz and 315 GHz were measured on HBTs with an emitter area of 0.17 × 1.01 μm2. The contribution of device parasitics to the high frequency performance was investigated by means of compact models and device simulation. Measured doping and Ge profiles were used as input for one-dimensional device simulations with a Boltzmann transport equation solver. The results of these simulations were related to the measured characteristics of the actual devices using a compact model which accounts for the external parasitics of the real three-dimensional device.
Keywords :
"Semiconductor process modeling","Doping","Silicon germanium","Heterojunction bipolar transistors","Layout","Geometry","Current measurement"
Publisher :
ieee
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting - BCTM, 2015 IEEE
Type :
conf
DOI :
10.1109/BCTM.2015.7340586
Filename :
7340586
Link To Document :
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