• DocumentCode
    37017
  • Title

    Fabrication-Tolerant Four-Channel Wavelength-Division-Multiplexing Filter Based on Collectively Tuned Si Microrings

  • Author

    De Heyn, P. ; De Coster, J. ; Verheyen, P. ; Lepage, G. ; Pantouvaki, M. ; Absil, P. ; Bogaerts, W. ; Van Campenhout, J. ; Van Thourhout, Dries

  • Author_Institution
    Dept. of Inf. Technol., Photonics Res. Group, Ghent Univ. - imec, Ghent, Belgium
  • Volume
    31
  • Issue
    16
  • fYear
    2013
  • fDate
    Aug.15, 2013
  • Firstpage
    2785
  • Lastpage
    2792
  • Abstract
    We demonstrate a robust, compact and low-loss four-channel wavelength-division multiplexing (WDM) filter based on cascaded double-ring resonators (2RR) in silicon. The flat-top channel response obtained by the second-order filter design is exploited to compensate for the detrimental effects of local fabrication variations and their associated phase errors on the ring-based filter response. Full wafer-scale characterization of a cascaded, four-channel 2RR filter with channel spacing of 300 GHz shows an average worst-case insertion loss below 1.5 dB and an average worst-case crosstalk below -18 dB across the wafer, representing a substantial improvement over a first-order based ring (1RR) design. The robust 2RR filter design enables the use of a simple collective thermal tuning mechanism to compensate for global fabrication variations as well as for global temperature fluctuations of the WDM filter, the WDM laser source, or both. Highly uniform collective heating is demonstrated using integrated doped silicon heaters. The compact filter footprint of less than 50×50 μm2 per channel enables straightforward scaling of the WDM channel count to 8 channels and beyond. Such low-loss collectively tuned ring-based WDM filters can prove beneficial in scaling the bandwidth density of chip-level silicon optical interconnects.
  • Keywords
    integrated optics; micro-optics; optical fabrication; optical filters; optical interconnections; silicon; wavelength division multiplexing; Si; WDM channel; WDM laser source; bandwidth density; cascaded double ring resonator; chip level silicon optical interconnect; collectively tuned microrings; fabrication tolerant WDM filter; flat top channel; four channel wavelength division multiplexing filter; second order filter design; thermal tuning mechanism; wafer scale characterization; Channel spacing; Heating; Receivers; Robustness; Silicon; Tuning; Wavelength division multiplexing; Design for manufacturing; microring resonators; silicon-on-Insulator (SOI); wavelength-division multiplexing;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.2013.2273391
  • Filename
    6558817