• DocumentCode
    3706381
  • Title

    Anomalous electrostatics and intrinsic variability in GeOI p-MOSFET

  • Author

    Chang-Hung Yu;Pin Su

  • Author_Institution
    Department of Electronics Engineering &
  • fYear
    2014
  • fDate
    6/1/2014 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We have reported anomalous electrostatic behaviors in drain-induced-barrier-lowering (DIBL), threshold voltage (VT) roll-off, subthreshold swing (SS), and intrinsic VT variability in GeOI p-MOSFET. The underlying mechanism responsible for these anomalous electrostatic characteristics is attributed to the valence-band offset between Ge channel and Si substrate due to their significant discrepancy in bandgap. This band offset results in an effective built-in forward body bias in GeOI pFET, and leads to different carrier profiles between GeOI pFET and nFET.
  • Keywords
    "Silicon","Electrostatics","Logic gates","MOSFET circuits","Permittivity","Photonic band gap","Very large scale integration"
  • Publisher
    ieee
  • Conference_Titel
    Silicon Nanoelectronics Workshop (SNW), 2014 IEEE
  • Print_ISBN
    978-1-4799-5676-0
  • Type

    conf

  • DOI
    10.1109/SNW.2014.7348618
  • Filename
    7348618