• DocumentCode
    3710973
  • Title

    Implications of accelerated B-O complex formation for mitigating LID in Czochralski silicon

  • Author

    Brett J. Hallam;Malcolm. D. Abbott;Nitin. Nampalli;Phill G. Hamer;Stuart R. Wenham

  • Author_Institution
    School of Photovoltaic and Renewable Energy Engineering, University of New South Wales, Kensington 2052, Australia
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    A three-state model is used to explore the influence of the accelerated formation of recombination-active defect complexes on the mitigation of light-induced degradation in p-type Czochralski silicon. Defect formation is observed to be a critical factor for the speed at which the defects can be hydrogenated. Defect formation also plays a critical role in determining the effectiveness of hydrogenation at elevated temperatures. It is observed that under conventional conditions, at a processing temperature of 200 °C, approximately 100 s are required to form- and hydrogenate 99% of possible defects. The improved effectiveness of the hydrogenation of light-induced defects at elevated temperatures as recently reported on finished standard screen printed solar cells within 8 s is consistent with a substantial acceleration of defect formation.
  • Keywords
    "Lead","Chlorine","Acceleration","Silicon"
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialist Conference (PVSC), 2015 IEEE 42nd
  • Type

    conf

  • DOI
    10.1109/PVSC.2015.7355689
  • Filename
    7355689