• DocumentCode
    3711157
  • Title

    Electroplated Al as the front electrode in crystalline-Si solar cells

  • Author

    Wen-Cheng Sun;Haifeng Zhang; Laidong Wang;Clarence J. Tracy;Meng Tao

  • Author_Institution
    School of Electrical, Computer and Energy Engineering, Arizona State University, Tempe, 85287, USA
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    This paper reports aluminum (Al) electroplating as the metallization technique for the front finger electrode on n-type silicon (Si) in crystalline-Si solar cells. The development of the Al electroplating process is motivated by the limited reserves of silver (Ag) on this planet and the industry-wide push to reduce Ag usage for cost control. The new metallization process consists of: (1) patterning the silicon nitride (SiNx) layer for front electrode; (2) depositing a nickel (Ni) seed layer into the opening; (3) electroplating self-aligned Al onto the Ni seed layer and (4) annealing the Al/Ni electrode in air at ~200°C. This temperature is far below the typical firing temperatures for commercial Al pastes. The new metallization process has been integrated into commercial p-type monocrystalline Si solar cells from Hareon Solar. An all-Al Si solar cell, with an electroplated Al front electrode and a screen-printed Al back electrode, has been demonstrated. The cell has a size of 2.54×2.54 cm2, with efficiencies approaching 15% demonstrated.
  • Keywords
    "Electrodes","Annealing","Silicon","Nickel","Photovoltaic cells","Resistance","Metallization"
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialist Conference (PVSC), 2015 IEEE 42nd
  • Type

    conf

  • DOI
    10.1109/PVSC.2015.7355874
  • Filename
    7355874