Title :
Epitaxial emitter reverse saturation current density: Modeling and experimental validation
Author :
John Renshaw;James Gee
Author_Institution :
Applied Materials, Santa Clara, CA, 95054 USA
fDate :
6/1/2015 12:00:00 AM
Abstract :
Through numerical simulation we explore the sensitivity of the emitter reverse saturation current density (J0e) to surface recombination velocity (SRV) of a uniformly doped phosphorus emitter compared with gaussian profile with similar sheet resistance. The uniformly doped emitter is capable of extremely low J0e´s of <; 10 fA/cm2, but is very transparent and thus extremely sensitive to the surface recombination velocity. While the gaussian profile cannot reach as low recombination, it is however more resilient to higher SRV´s. Finally, we experimentally demonstrate a 2 fA/cm2 total device J0 on a test structure with the same epi emitter explored in the previous simulations.
Keywords :
"Epitaxial growth","Surface texture","Chlorine","Phosphorus","Semiconductor process modeling","Semiconductor device reliability"
Conference_Titel :
Photovoltaic Specialist Conference (PVSC), 2015 IEEE 42nd
DOI :
10.1109/PVSC.2015.7356047