DocumentCode :
3711656
Title :
Evolution of the silicon bottom cell photovoltaic behavior during III–V on Si multi-junction solar cells production
Author :
E. Garc?a-Tabar?s;T.J. Grassman;D. Mart?n;J. Carlin;I. Rey-Stolle;S.A. Ringel
Author_Institution :
Instituto de Energ?a Solar, Universidad Polit?cnica de Madrid, Spain
fYear :
2015
fDate :
6/1/2015 12:00:00 AM
Firstpage :
1
Lastpage :
6
Abstract :
The evolution of the Si bulk minority carrier lifetime during the heteroepitaxial growth of III-V on Si multi-junction solar cell structures via metal-organic vapor phase epitaxy has been analyzed. Initially, the emitter formation produces important lifetime degradation. Nevertheless, a progressive recovery was observed during the growth of the metamorphic GaAsP/Si structure. A step-wise mechanism has been proposed to explain the lifetime evolution observed during this process. The initial lifetime degradation is believed to be related to the formation of thermally-induced defects within the Si bulk. These defects are subsequently passivated by fast-diffusing atomic hydrogen -coming from precursor (i.e. PH3 and AsH3) pyrolysis- during the subsequent III-V growth. These results indicate that the MOVPE environment used to create the III-V/Si solar cell structures has a dynamic impact on the minority carrier lifetime. Consequently, designing processes that promote the recovery of the lifetime is a must to support the production of high-quality III-V/Si solar cells.
Keywords :
"Silicon","Epitaxial growth","Annealing","Charge carrier lifetime","Photovoltaic cells","Epitaxial layers","Degradation"
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialist Conference (PVSC), 2015 IEEE 42nd
Type :
conf
DOI :
10.1109/PVSC.2015.7356380
Filename :
7356380
Link To Document :
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