• DocumentCode
    3711657
  • Title

    Watching the formation of the GaP/Si(100) heterointerface in situ

  • Author

    Oliver Supplie;Matthias M. May;Sebastian Br?ckner;Andreas N?gelein;Peter Kleinschmidt;Thomas Hannappel

  • Author_Institution
    Technische Universit?t Ilmenau, Institut f?r Physik, Postfach 100565, 98684, Germany
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    III-V/Si(100) heterointerfaces are essential for future tandem solar cells. We watch their formation in situ with reflection anisotropy spectroscopy (RAS) during chemical vapor deposition and benchmark RAS to LEED and XPS. An optical anisotropy evolves during GaP nucleation on Si(100), agreeing well with that of the buried heterointerface. P and Si photoemission lines exhibit a chemically shifted component, which quantitatively corresponds to one monolayer. We attribute this to Si-P bonds at the heterointerface. We prepare ultrathin, atomically well-ordered, single-domain GaP epilayers. Sub-monolayer amounts of background residuals diffusing on Si(100) prior nucleation highly impact the formation of the heterointerface.
  • Keywords
    "Atom optics","Silicon","Optical reflection","Inductors","Atomic layer deposition","Indexes","Nuclear measurements"
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialist Conference (PVSC), 2015 IEEE 42nd
  • Type

    conf

  • DOI
    10.1109/PVSC.2015.7356381
  • Filename
    7356381