DocumentCode :
3712583
Title :
Influence of thermo-mechanical stress on the microstructure of sintered silver joints for microelectronics
Author :
Thomas Geoffroy;Jean-Christophe Riou;Eric Bailly;Gilles Tarrisse;Yves Bienvenu
Author_Institution :
Safran Electronics - Sagem, 95 route de Montelier, 26 000 Valence, France
fYear :
2015
Firstpage :
62
Lastpage :
65
Abstract :
Silver sintering is a promising emerging microelectronic assembly technology. In this paper sintered silver attachment joints of silicon dies have been studied. It has been pointed out that in pressureless process conditions porosity can disappear of some zones of silver sintered attachment joints. The link between densified zones and the thermo-mechanical stress has been demonstrated. Densified zones of silver sintered joints could play a great role in reliability improvement.
Keywords :
"Silver","Stress","Fatigue","Assembly","Silicon","Copper","Thermomechanical processes"
Publisher :
ieee
Conference_Titel :
CPMT Symposium Japan (ICSJ), 2015 IEEE
Print_ISBN :
978-1-4799-8814-3
Type :
conf
DOI :
10.1109/ICSJ.2015.7357360
Filename :
7357360
Link To Document :
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