DocumentCode :
3713823
Title :
Characterization of single and composites thin films memristive device
Author :
S. M. M. Kasim;N. A. A. Shaari;R. A. Bakar;Z. Aznilinda;Zulfakri Mohamad;S. H. Herman
Author_Institution :
NANO-Electronic Center, Faculty of Electrical Engineering, Universiti Teknologi MARA, 40450 Shah Alam, Selangor, Malaysia
fYear :
2015
Firstpage :
34
Lastpage :
38
Abstract :
In this paper, three different sets of samples were prepared to compare the memristive behavior of single layer metal oxide which is zinc oxide (ZnO) as well as two composite ZnO and TiO2 double layer thin film samples. Spin coating method was selected to deposit ZnO and TiO2 solutions on indium tin oxide (ITO)/Glass substrate. Platinum (Pt) was used as the top metal electrode which had been deposited on metal oxide layer using sputtering method. Memristive behavior determined by the current-voltage (I-V) characterization had been measured using two-point probe I-V measurement. From the I-V characteristics, it can be seen that pinched hysteresis loop were seen for all samples yet hysteresis loop with composite layer gave a wider loop compared to the single one. Thus, it can be observed that composite layer affects the behavior of memristive device.
Keywords :
"Zinc oxide","II-VI semiconductor materials","Surface morphology","Substrates","Hysteresis","Morphology"
Publisher :
ieee
Conference_Titel :
Technology Management and Emerging Technologies (ISTMET), 2015 International Symposium on
Type :
conf
DOI :
10.1109/ISTMET.2015.7358996
Filename :
7358996
Link To Document :
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