DocumentCode :
3715466
Title :
First-principles study of the H2S passivation on 6H-SiC (0001) surface
Author :
Qingqing Xing; Ying Yang; Jin Chen; Miaomiao Chao; Li Zhang
Author_Institution :
Department of Electronic Engineering, Xi´an University of Technology, China
fYear :
2015
Firstpage :
1
Lastpage :
4
Abstract :
Passivation is an effective way to reduce density of states (DOS) on the surface. In order to verify the differences and stabilities of H2S passivation on Si- and C-face of 6H-SiC, the adsorption of H2S on surface is studied by the first principles method, which is based on the density functional theory. Adsorption configuration and stability are researched with the coverage changing from 1/9monolayer (ML) to 1/3ML on Si-face while 1/9ML to 5/9ML on C-face. Adsorption energy, DOS and charge population of the system are calculated separately. On Si-face, energy calculations show that H2S which is adsorbed at the bridge (BR) site is more stable than that adsorbed at the on-top (OT) site. After H2S is decomposed, S atoms are combined at the BR site, while H atoms are adsorbed at the OT site. The surface states are noticeably reduced after passivation. Surface states are reduced to the lowest when the coverage is 2/9ML. On C-face, H2S which is adsorbed at the OT site is more stable than that adsorbed at the BR site. After H2S is decomposed, HS bonds and H atoms are all combined at the OT site. The surface states are noticeably reduced to the lowest when the coverage is 4/9ML.
Keywords :
"Adsorption","Passivation","Sociology","Statistics","Silicon","Silicon carbide","Atomic layer deposition"
Publisher :
ieee
Conference_Titel :
Future Energy Electronics Conference (IFEEC), 2015 IEEE 2nd International
Print_ISBN :
978-1-4799-7655-3
Type :
conf
DOI :
10.1109/IFEEC.2015.7361435
Filename :
7361435
Link To Document :
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