DocumentCode :
3718347
Title :
CIP metrology improving the bump yield in photo-lithography process
Author :
Mu-Chun Wang; Wei-Chun Chung; Yi-Hong Yu; Yu-Wei Wang; Chii-Wen Chen; Wen-How Lan
Author_Institution :
Dept. of Electronic Engineering / Minghsin University of Science and Technology, Hsinchu30401, Taiwan
fYear :
2015
Firstpage :
386
Lastpage :
389
Abstract :
With the seven quality control methods under the CIP control, the entire package yield in micro-bump products is promoted from 99.31% to 99.58% during four-month record and tracking. Through these effective and analytical efforts, the rework ratio in the abnormal PR coating contribution was decreased from 0.29% to 0.19%. The result for the auto misalignment was reduced from 0.23% to 0.13% as well for the repeatable defect from 0.17% to 0.1%. The whole package yield during these three issues was promoted around 0.3%.
Keywords :
"Coatings","Gold","Assembly","Lithography","Monitoring","Metrology","Integrated circuits"
Publisher :
ieee
Conference_Titel :
Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2015 10th International
Print_ISBN :
978-1-4673-9690-5
Type :
conf
DOI :
10.1109/IMPACT.2015.7365235
Filename :
7365235
Link To Document :
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