Title :
A PIC-MCC modeling of sheath recovery processes after current zero
Author :
Zhenxing Wang;Haoran Wang;Zhipeng Zhou;Yingsan Geng;Jianhua Wang;Zhiyuan Liu
Author_Institution :
State Key Laboratory of Electrical Insulation and Power Equipment, Xi´an Jiaotong University, Xi´an, China
Abstract :
A sheath recovery process dominants the initial stage of a dielectric recovery process after interrupting a vacuum arc current. The objective of this paper is to model a post-arc sheath recovery process by using PIC-MCC method. Second electrons, external circuit, and fundamental collisions between particles were taken into considerate in the model. The result shows that the amplitude of post-arc current have a proportional relationship with initial density of plasma. The sheath recovery time turned slowing down after a quick increase with the increase of initial plasma density.
Keywords :
"Ions","Copper","Plasma density","Cathodes","Integrated circuit modeling","Anodes"
Conference_Titel :
Electric Power Equipment ? Switching Technology (ICEPE-ST), 2015 3rd International Conference on
DOI :
10.1109/ICEPE-ST.2015.7368383