DocumentCode
3721039
Title
An extraction method of charge trapping site distribution in AlGaN layer in GaN HEMT
Author
T. Baba;K. Kakushima;H. Wakabayashi;K. Tsutsui;H. Iwai
Author_Institution
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama, Japan
fYear
2015
Firstpage
125
Lastpage
128
Abstract
The density and distribution of electron traps in AlGaN layer of GaN HEMT have been characterized. Based on electron tunneling between 2DEG and trap sites, the distance and density can be extracted with frequency dependent capacitance and conductance responses. With parameter fitting to measured capacitance and conductance spectra, a trap density of Nbt = 1021 cm-3eV-1 has be extracted. With different gate voltage or measurement temperature, the trap distribution within the AlGaN layer can be extracted under the same frequency range. From measurement temperature dependency, a capture cross section σ0 = 8 × 10-10 cm2 with an activation energy of 0.42 eV has been extracted.
Keywords
"Aluminum gallium nitride","Wide band gap semiconductors","HEMTs","Electron traps","Logic gates","Temperature measurement","Capacitance"
Publisher
ieee
Conference_Titel
Wide Bandgap Power Devices and Applications (WiPDA), 2015 IEEE 3rd Workshop on
Type
conf
DOI
10.1109/WiPDA.2015.7369253
Filename
7369253
Link To Document