• DocumentCode
    3721089
  • Title

    Key structure and process for pulsed power switch SiC RSD

  • Author

    Lin Liang;Ming Pan;Ludan Zhang;Yuxiong Shu

  • Author_Institution
    School of Optical and Electronic Information, Huazhong University of Sci & Tech, Wuhan, China
  • fYear
    2015
  • Firstpage
    170
  • Lastpage
    173
  • Abstract
    This paper focuses on the several key problems in the design and process for the new type pulsed power switch SiC RSD(reversely switched dynistor). By establishing the two-dimensional electro-thermal coupling model, the temperature rise during the turn-on process is discussed. The feasibility of the reverse injection pre-charge caused by avalanche breakdown is proved. The big influence of the carrier lifetime in drift layer and the proper distribution of the cell structure at anode are analyzed. Reasonable ohmic contact results suitable both for P and N type are acquired by process exploring. The surface breakdown voltage is enhanced by the bevel edge termination. The above work has provided basis for realizing the pulse turn-on of SiC RSD.
  • Keywords
    "Silicon carbide","Junctions","Silicon","Optical switches","Ohmic contacts","Anodes"
  • Publisher
    ieee
  • Conference_Titel
    Wide Bandgap Power Devices and Applications (WiPDA), 2015 IEEE 3rd Workshop on
  • Type

    conf

  • DOI
    10.1109/WiPDA.2015.7369304
  • Filename
    7369304