DocumentCode
3721705
Title
Micromachined silicon hemispherical resonators with self-aligned spherical capacitive electrodes
Author
Xuye Zhuang;Xinlong Wang;Lei Yu;Pinghua Li;Bo Chen;Qunying Guo;Shuwen Guo
Author_Institution
East China Institute of Photo-Electronic IC, Bengbu, China
fYear
2015
Firstpage
1
Lastpage
4
Abstract
A micromachined silicon hemispherical resonator with self-aligned silicon spherical capacitive electrodes is developed for the first time. Spherical electrodes, owning the same curvature of the resonator shell, surround the shell and extend into the cave deeply (160μm). The gap between the electrodes and shell is made by a sacrificial layer and a uniform and small (1.5μm) gap is obtained, which enables a large drive and sense capacitance of the resonator. Spherical electrodes are integrated as a part of the resonators fabrication process, and no extra assembly process is needed, ensuring the symmetry of the resonator. A resonator with 790μm diameter and thickness of 1.5μm has been demonstrated by the self-aligned fabrication process. The radial deviation of the hemispherical shell is less than 1.22μm for the ~500 radius shell (0.24%).
Keywords
"Electrodes","Silicon","Fabrication","Glass","Metals","Micromechanical devices","Capacitance"
Publisher
ieee
Conference_Titel
SENSORS, 2015 IEEE
Type
conf
DOI
10.1109/ICSENS.2015.7370238
Filename
7370238
Link To Document