DocumentCode
3723648
Title
Wafer requirement for future power devices
Author
Shin-ichi Nishizawa
Author_Institution
Nat. Inst. of Adv. Ind. Sci. &
fYear
2015
Firstpage
1
Lastpage
2
Abstract
For the future power electronics system, one of the key issues is to achieve more high power densities. At the moment, several types of silicon devices are widely used from the low voltage to high voltage ranges. To achieve more high power densities by size reduction and more high operating temperature, not only the device but also wafer material should be improved. The current status and future prospect of PE system with silicon technology will be discussed. Then, the role of compound semiconductor and its devices will be also discussed by comparison with silicon PE system.
Keywords
"Low voltage","Impurities"
Publisher
ieee
Conference_Titel
TENCON 2015 - 2015 IEEE Region 10 Conference
ISSN
2159-3442
Print_ISBN
978-1-4799-8639-2
Electronic_ISBN
2159-3450
Type
conf
DOI
10.1109/TENCON.2015.7372890
Filename
7372890
Link To Document