DocumentCode :
3723648
Title :
Wafer requirement for future power devices
Author :
Shin-ichi Nishizawa
Author_Institution :
Nat. Inst. of Adv. Ind. Sci. &
fYear :
2015
Firstpage :
1
Lastpage :
2
Abstract :
For the future power electronics system, one of the key issues is to achieve more high power densities. At the moment, several types of silicon devices are widely used from the low voltage to high voltage ranges. To achieve more high power densities by size reduction and more high operating temperature, not only the device but also wafer material should be improved. The current status and future prospect of PE system with silicon technology will be discussed. Then, the role of compound semiconductor and its devices will be also discussed by comparison with silicon PE system.
Keywords :
"Low voltage","Impurities"
Publisher :
ieee
Conference_Titel :
TENCON 2015 - 2015 IEEE Region 10 Conference
ISSN :
2159-3442
Print_ISBN :
978-1-4799-8639-2
Electronic_ISBN :
2159-3450
Type :
conf
DOI :
10.1109/TENCON.2015.7372890
Filename :
7372890
Link To Document :
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