• DocumentCode
    3723648
  • Title

    Wafer requirement for future power devices

  • Author

    Shin-ichi Nishizawa

  • Author_Institution
    Nat. Inst. of Adv. Ind. Sci. &
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    For the future power electronics system, one of the key issues is to achieve more high power densities. At the moment, several types of silicon devices are widely used from the low voltage to high voltage ranges. To achieve more high power densities by size reduction and more high operating temperature, not only the device but also wafer material should be improved. The current status and future prospect of PE system with silicon technology will be discussed. Then, the role of compound semiconductor and its devices will be also discussed by comparison with silicon PE system.
  • Keywords
    "Low voltage","Impurities"
  • Publisher
    ieee
  • Conference_Titel
    TENCON 2015 - 2015 IEEE Region 10 Conference
  • ISSN
    2159-3442
  • Print_ISBN
    978-1-4799-8639-2
  • Electronic_ISBN
    2159-3450
  • Type

    conf

  • DOI
    10.1109/TENCON.2015.7372890
  • Filename
    7372890