DocumentCode
3725932
Title
A nanomembrane-based bandgap-tunable Ge microdisk for Si-compatible optoelectronics
Author
D. Nam;D. Sukhdeo;J. Kang;M. Brongersma;K. Saraswat
Author_Institution
Department of Electronic Engineering, Inha University, Incheon 402-751, South Korea
Volume
1
fYear
2015
Firstpage
1
Lastpage
2
Abstract
We present a new, CMOS-compatible platform for inducing a large, spatially homogeneous biaxial strain in Ge microdisks. This platform can deliver substantial performance improvements to biaxially strained Ge lasers for silicon-compatible optical interconnects.
Keywords
"Strain","Germanium","Silicon","Performance evaluation","Photonic band gap","Finite element analysis","Photonics"
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2015 11th Conference on
Type
conf
DOI
10.1109/CLEOPR.2015.7375923
Filename
7375923
Link To Document