Title :
Actinic EUV mask inspection using coherent EUV source based on high-order harmonic generation
Author :
Yong Soo Kim;June Park;Han Yong Park;Hamin Sung;Jomsool Kim;Seung Beom Lee;Hyun Woo Cho;Ju Han Lee;Min-Chul Park;Young Min Jhon
Author_Institution :
Korea Institute of Science of Technology, 5, Hwarang-ro 14-gil, Seongbuk-gu, Seoul
Abstract :
We developed a coherent scattering microscope (CSM) for actinic EUV mask inspection. The CSM system was designed to measure critical dimensions down to 88 nm, and 200 nm l/s patterns were experimentally inspected.
Keywords :
"Ultraviolet sources","Inspection","Lithography","Frequency conversion","Diffraction","Laser beams","Laser excitation"
Conference_Titel :
Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2015 11th Conference on
DOI :
10.1109/CLEOPR.2015.7376009
