DocumentCode :
3726172
Title :
Laser-induced spray jet cleaning for nanoscale contaminant removal using water-isopropyl alcohol mixtures
Author :
Changho Seo;Dongsik Kim
Author_Institution :
Department of Mechanical Engineering POSTECH, Pohang 790-784, Republic of Korea
Volume :
2
fYear :
2015
Firstpage :
1
Lastpage :
2
Abstract :
In this work, we demonstrate a novel laser-induced spray jet cleaning process using non-water cleaning agents including isopropyl alcohol. The process could remove <;30 nm PSL particles from silicon surfaces without watermark generation.
Keywords :
"Cleaning","Surface treatment","Liquids","Nanoscale devices","Watermarking","Electric breakdown","Silicon"
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2015 11th Conference on
Type :
conf
DOI :
10.1109/CLEOPR.2015.7376165
Filename :
7376165
Link To Document :
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