Title :
Combined optical/e-beam lithography approach for the development of HfO2-based memristors in crossbars
Author :
R. Kirtaev;Yu. Matveyev;A. Fetisova;D. Negrov;A. Zenkevich
Author_Institution :
Moscow Institute of Physics and Technology, Russia
fDate :
11/1/2015 12:00:00 AM
Abstract :
In this work, crossbars with memristors down to 40x40 nm2 in size were fabricated by hybrid process combining optical and e-beam lithography. The developed process provides ~90% yield of <;<;forming-free>> nanodevices exhibiting memristive properties with endurance up to 105 cycles, making this approach suitable for neuromorphic applications.
Keywords :
"Hafnium compounds","Memristors","Resists","Resistance","Lithography","Tin","Plasmas"
Conference_Titel :
Memristive Systems (MEMRISYS) 2015 International Conference on
DOI :
10.1109/MEMRISYS.2015.7378397