DocumentCode :
3727696
Title :
Combined optical/e-beam lithography approach for the development of HfO2-based memristors in crossbars
Author :
R. Kirtaev;Yu. Matveyev;A. Fetisova;D. Negrov;A. Zenkevich
Author_Institution :
Moscow Institute of Physics and Technology, Russia
fYear :
2015
fDate :
11/1/2015 12:00:00 AM
Firstpage :
1
Lastpage :
2
Abstract :
In this work, crossbars with memristors down to 40x40 nm2 in size were fabricated by hybrid process combining optical and e-beam lithography. The developed process provides ~90% yield of <;<;forming-free>> nanodevices exhibiting memristive properties with endurance up to 105 cycles, making this approach suitable for neuromorphic applications.
Keywords :
"Hafnium compounds","Memristors","Resists","Resistance","Lithography","Tin","Plasmas"
Publisher :
ieee
Conference_Titel :
Memristive Systems (MEMRISYS) 2015 International Conference on
Type :
conf
DOI :
10.1109/MEMRISYS.2015.7378397
Filename :
7378397
Link To Document :
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