DocumentCode :
3731692
Title :
Electrical characteristics analysis and comparison between through silicon via(TSV) and through glass via(TGV)
Author :
Jihye Kim;Insu Hwang;Youngwoo Kim;Heegon Kim;Joungho Kim;Venky Sundaram;Rao Tummala
Author_Institution :
Department of Electrical Engineering, KAIST, Daejeon, South Korea
fYear :
2015
Firstpage :
93
Lastpage :
96
Abstract :
The electrical characteristics of silicon and glass interposer channel are heavily affected by the design of through silicon via (TSV) and through glass via (TGV). In this paper, we analyzed the overall signal integrity of glass and silicon interposer channel including through package via. To compare electrical property between silicon and glass, we simulated these channels in frequency-domain and time-domain. We observed s-parameter of single and multiple via transition channel. Moreover we compared the characteristic impedance and eye diagram simulation results. Finally, we observed the change of electrical characteristics when the impedance mismatch is occurred at via pad.
Keywords :
"Silicon","Glass","Impedance","Substrates","Capacitance","Insertion loss","Packaging"
Publisher :
ieee
Conference_Titel :
Electrical Design of Advanced Packaging and Systems Symposium (EDAPS), 2015 IEEE
Type :
conf
DOI :
10.1109/EDAPS.2015.7383676
Filename :
7383676
Link To Document :
بازگشت