Title :
Chemical vapor deposition of transfer-free graphene on SiO2/Si using a sacrificial copper film
Author :
Yuchun Chen; Minjui Lo; Chihchun Chang; Pinyi Lee; Chenglung Chung; Yonhua Tzeng
Author_Institution :
Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, No. 1 University Road, Tainan City 70101, Taiwan, ROC
fDate :
7/1/2015 12:00:00 AM
Abstract :
Graphene is deposited directly on a non-metal substrate, i.e. SiO2/Si with a sacrificial copper film. The copper film is either evaporated during prolonged growth time or removed by wet chemical etching after CVD graphene grows on it. This leaves the graphene sticking directly to the SiO2/Si without needing any transferring process. Effects of the copper film thickness, the growth time, and the wet chemical etching on the morphology and Raman scattering of the synthesized transfer-free graphene are analyzed and reported.
Keywords :
"Graphene","Substrates","Optical films","Optical imaging","Copper","Etching"
Conference_Titel :
Nanotechnology (IEEE-NANO) , 2015 IEEE 15th International Conference on
DOI :
10.1109/NANO.2015.7388665
