DocumentCode :
3734765
Title :
A wedge tunnel FET device for larger tunneling area and improved ON current
Author :
Astha Tyagi;Vipin Joshi;Shree Prakash Tiwari
Author_Institution :
Department of Electrical Engineering, Indian Institute of Technology Jodhpur, Rajasthan, India, 342011
fYear :
2015
fDate :
7/1/2015 12:00:00 AM
Firstpage :
913
Lastpage :
915
Abstract :
In an attempt to improve ON current and current ON/OFF ratio in tunnel field-effect Transistors (TFETs), a new wedge shaped structure for TFET named Wedge-TFET (WTFET) is proposed. This proposed device is a double gate structure, showing ~3 times higher ON current compared to planar double gate TFET device working at supply voltage of 0.6 to 1.0 V. This increase is mainly due to increase in the tunneling area. In addition to increased current, W-TFET also shows high current ON/OFF ratio of the order ~1012. The subthreshold swing values are slightly higher for W-TFET compared to our simulated DG-TFET, however, both of them fall in the range of 40 to 50 mV/dec. The W-TFET device with higher ON current and current ON/OFF ratio and with almost same area requirement can be a potential candidate for future low voltage applications.
Keywords :
"Logic gates","Tunneling","Performance evaluation","MOSFET"
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO) , 2015 IEEE 15th International Conference on
Type :
conf
DOI :
10.1109/NANO.2015.7388763
Filename :
7388763
Link To Document :
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