• DocumentCode
    3734842
  • Title

    Contact engineering for nanocarbon interconnects

  • Author

    Yusuke Abe;Anshul Vyas;Richard Senegor;Patrick Wilhite;Cary Y. Yang

  • Author_Institution
    Center for Nanostructures, Santa Clara University, CA 95053, USA
  • fYear
    2015
  • fDate
    7/1/2015 12:00:00 AM
  • Firstpage
    1194
  • Lastpage
    1196
  • Abstract
    Electron-beam-induced deposited-tungsten (EBID-W) technique is used to fabricate contacts for carbon nanofiber (CNF) horizontal interconnect and carbon nanotube (CNT) vertical vias to improve the contact resistances at the nanocarbon-metal electrodes.
  • Keywords
    "Resistance","Carbon nanotubes","Contacts","Electrodes","Metallization","Integrated circuit interconnections","Electrical resistance measurement"
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO) , 2015 IEEE 15th International Conference on
  • Type

    conf

  • DOI
    10.1109/NANO.2015.7388840
  • Filename
    7388840
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3734842