DocumentCode :
3735282
Title :
Investigation into the thermal effects of thinning stacked dies in three-dimensional integrated circuits
Author :
Samson Melamed;Naoya Watanabe;Shunsuke Nemoto;Katsuya Kikuchi;Masahiro Aoyagi
Author_Institution :
National Institute of Advanced Industrial Science and Technology (AIST) Central 2, 1-1-1 Umezono, Tsukuba, Japan 305-8568
fYear :
2015
Firstpage :
1
Lastpage :
4
Abstract :
In three-dimensional integrated circuits (3DICs) aggressive wafer-thinning can lead to large thermal gradient, including spikes in individual device temperatures. In a non-thinned circuit the large bulk silicon wafer on which devices are built works as a very good thermal conductor, enabling heat to diffuse laterally. In this paper we experimentally examine the thermal resistance from an active heater to the heatsink in a two-tier bump-bonded 3D stacked system. A simplified structure is introduced to enable such measurements without the time and cost associated with the full fabrication of such a system. Die thinning is seen to have a pronounced effect on the thermal response. Thinning the top tier from 725 μm to 20 μm results in a nearly 7 times increase in the thermal resistance from heater to heatsink.
Keywords :
"Temperature measurement","Resistance heating","Silicon","Thermal conductivity","Conductivity","Thermal resistance"
Publisher :
ieee
Conference_Titel :
Thermal Investigations of ICs and Systems (THERMINIC), 2015 21st International Workshop on
Type :
conf
DOI :
10.1109/THERMINIC.2015.7389637
Filename :
7389637
Link To Document :
بازگشت