Plasma dicing for thin wafers

Recently many issues came up when using conventional dicing methods. Such conventional methods are mechanical sawing (blade dicing) or laser dicing or stealth dicing. Relevant applications are thin wafers, brittle materials and wafer singulation for very small devices or LED or discretes. Plasma dicing is a recommended method to overcome many challenges of wafer separation. Damage free, water free, particle free and high throughput dicing can be realized by using plasma trench etch (dry etch) technology for dicing. Several technical and equipment aspects will be presented and discussed accordingly. Plasma dicing technology can provide solutions for high rate dicing, beautiful chip shape without any chipping and high bonding strength. Future challenges such as SiC dicing or GaN-on-Silicon dicing will be discussed.