• DocumentCode
    3741139
  • Title

    Gratings preparation of 2?m antimonide distributed feedback laser diode

  • Author

    Zhanqi Gao;Yong Wang;Zhen Ye;Yunyi Zhuang;Siyuan Zhang;Yongqin Hao;Yuan Feng;Zaijin Li;Yang Li;Jiabin Zhang;Xiaohua Wang

  • Author_Institution
    National Key Lab on High Power Semiconductor Lasers Changchun University of Science and Technology, Changchun 130022, China
  • fYear
    2015
  • fDate
    7/1/2015 12:00:00 AM
  • Firstpage
    345
  • Lastpage
    347
  • Abstract
    This paper designed the period, depth and duty cycle of second-order Bragg grating. The grating is fabricated on GaSb substrate by holographic photolithography and wet etching. Images of scanning electron microscopy (SEM) and atomic force microscopy (AFM) show that the grating has a period of 528nm, duty cycle of 0.25, depth of 109nm, the graphic shows an ideal sinusoid with favourable continuity and uniformity.
  • Keywords
    "Bragg gratings","Gratings","Lithography","Couplings","Diode lasers","Etching","Resists"
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronics and Microelectronics (ICOM), 2015 International Conference on
  • Type

    conf

  • DOI
    10.1109/ICoOM.2015.7398839
  • Filename
    7398839
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3741139