DocumentCode :
3741139
Title :
Gratings preparation of 2?m antimonide distributed feedback laser diode
Author :
Zhanqi Gao;Yong Wang;Zhen Ye;Yunyi Zhuang;Siyuan Zhang;Yongqin Hao;Yuan Feng;Zaijin Li;Yang Li;Jiabin Zhang;Xiaohua Wang
Author_Institution :
National Key Lab on High Power Semiconductor Lasers Changchun University of Science and Technology, Changchun 130022, China
fYear :
2015
fDate :
7/1/2015 12:00:00 AM
Firstpage :
345
Lastpage :
347
Abstract :
This paper designed the period, depth and duty cycle of second-order Bragg grating. The grating is fabricated on GaSb substrate by holographic photolithography and wet etching. Images of scanning electron microscopy (SEM) and atomic force microscopy (AFM) show that the grating has a period of 528nm, duty cycle of 0.25, depth of 109nm, the graphic shows an ideal sinusoid with favourable continuity and uniformity.
Keywords :
"Bragg gratings","Gratings","Lithography","Couplings","Diode lasers","Etching","Resists"
Publisher :
ieee
Conference_Titel :
Optoelectronics and Microelectronics (ICOM), 2015 International Conference on
Type :
conf
DOI :
10.1109/ICoOM.2015.7398839
Filename :
7398839
Link To Document :
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