DocumentCode
3741147
Title
Research on metal lift-off in fabrication of a vertical cavity surface emitting laser
Author
Li Hongyu;Hao Yongqin;Shi Baohua;Zhang Jiabin;Li Yang;Feng Yuan;Wang Yong;Yan Changling;Liu Guojun
Author_Institution
National Key Lab of High-Power Semiconductor Laser, CUST, Changchun, 130022, China
fYear
2015
fDate
7/1/2015 12:00:00 AM
Firstpage
379
Lastpage
382
Abstract
Metal lift-off in fabrication of P-type electrode of a VCSEL is presented. The lithography patterns directly affect the result of metal lift-off, so the effect of AZ5214 as positive and negative photoresist on metal lift-off is investigated, and the influence factors, such as exposure time, baking temperature and time, are studied in detail. Adopting AZ5214 negative process and optimizing process parameters, an inverse image with angle of 70° is obtained. Finally, perfect P-type electrode of a VCSEL is fabricated. The results show that AZ5214 negative process is a good choice for metal lift-off, especially suitable for metal lift-off in fabrication of a VCSEL with a small aperture.
Keywords
"Vertical cavity surface emitting lasers","Electrodes","Metals","Resists","Lithography","Fabrication","Microelectronics"
Publisher
ieee
Conference_Titel
Optoelectronics and Microelectronics (ICOM), 2015 International Conference on
Type
conf
DOI
10.1109/ICoOM.2015.7398847
Filename
7398847
Link To Document