Title :
Research on metal lift-off in fabrication of a vertical cavity surface emitting laser
Author :
Li Hongyu;Hao Yongqin;Shi Baohua;Zhang Jiabin;Li Yang;Feng Yuan;Wang Yong;Yan Changling;Liu Guojun
Author_Institution :
National Key Lab of High-Power Semiconductor Laser, CUST, Changchun, 130022, China
fDate :
7/1/2015 12:00:00 AM
Abstract :
Metal lift-off in fabrication of P-type electrode of a VCSEL is presented. The lithography patterns directly affect the result of metal lift-off, so the effect of AZ5214 as positive and negative photoresist on metal lift-off is investigated, and the influence factors, such as exposure time, baking temperature and time, are studied in detail. Adopting AZ5214 negative process and optimizing process parameters, an inverse image with angle of 70° is obtained. Finally, perfect P-type electrode of a VCSEL is fabricated. The results show that AZ5214 negative process is a good choice for metal lift-off, especially suitable for metal lift-off in fabrication of a VCSEL with a small aperture.
Keywords :
"Vertical cavity surface emitting lasers","Electrodes","Metals","Resists","Lithography","Fabrication","Microelectronics"
Conference_Titel :
Optoelectronics and Microelectronics (ICOM), 2015 International Conference on
DOI :
10.1109/ICoOM.2015.7398847