DocumentCode :
3741169
Title :
Optical properties research of a - Si thin film by electron beam evaporation
Author :
Qiuhui Zhuang;Guojun Liu;Xiuhua Fu;Ma Zi
Author_Institution :
Changchun University of Science and Technology, Changchun 130022, China
fYear :
2015
fDate :
7/1/2015 12:00:00 AM
Firstpage :
470
Lastpage :
473
Abstract :
Optical properties of optical thin film is the basis of the design and preparation of thin films. this paper studied the basal temperature, vacuum degree of work and deposition rate of a - Si thin film optical constants through test. Results showed that the substrate temperature is 150 □ and the deposition rate is 0.5 nm/s, can get optical performance more optimized a - Si optical thin film.
Keywords :
"Silicon","Refractive index","Optical films","Optical refraction","Optical variables control","Substrates"
Publisher :
ieee
Conference_Titel :
Optoelectronics and Microelectronics (ICOM), 2015 International Conference on
Type :
conf
DOI :
10.1109/ICoOM.2015.7398869
Filename :
7398869
Link To Document :
بازگشت