Research of effecting factors on ion-barrier film of micro-channel plate by electron beam evaporation

Preparation process of ion-feedback barrier film (IBF) on Micro-channel Plate(MCP) is indispensable technology for the third generation image intensifier or even more image intensifier with high-performance. The technology of IBF is the best way to improve lifetime of image intensifier, to delay fatigue of photocathode because of the special substrate, for the traditional method of RF magnetron sputtering, sputtering atomic energy is too high, the film density is poor, the paper employs an alternative method of electron evaporation to prepare IBF, under the conditions of the working pressure: 2×10^-1Pa, rating: 1.7Å/s, through changing the oxygen flowing and the evaporation time, the parameters are optimized to prepare more dense IBF. We explored the best evaporation time and O₂ flowing, under the test conditions, the IBF can be prepared with acceptable quality, eventually the optimum conditions of preparing IBF with high density is explored by electron beam evaporation technique.