DocumentCode
3748074
Title
A floating gate based 3D NAND technology with CMOS under array
Author
Krishna Parat;Chuck Dennison
Author_Institution
Intel Corporation, 2200 Mission College Blvd., Santa Clara, CA 95054
fYear
2015
Abstract
NAND Flash has followed Moore´s law of scaling for several generations. With the minimum half-pitch going below 20nm, transition to a 3D NAND cell is required to continue the scaling. This paper describes a floating gate based 3D NAND technology with superior cell characteristics relative to 2D NAND, and CMOS under array for high Gb/mm2 density.
Keywords
"Three-dimensional displays","Logic gates","Computer architecture","Microprocessors","Nonvolatile memory","CMOS integrated circuits","Flash memories"
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN
2156-017X
Type
conf
DOI
10.1109/IEDM.2015.7409618
Filename
7409618
Link To Document