Title :
On and off state hot carrier reliability in junctionless high-K MG gate-all-around nanowires
Author :
M. Cho;G. Hellings;A. Veloso;E. Simoen;Ph. Roussel;B. Kaczer;H. Arimura;W. Fang;J. Franco;P. Matagne;N. Collaert;D. Linten;A. Thean
Author_Institution :
imec- kapeldreef 75, B-3001, Leuven, Belgium
Abstract :
Hot carrier (HC) reliability is investigated at `on´ and `off´ state stress conditions in junctionless (JL) gate-all-around HK/MG nanowires. We discuss the reason of improved HC reliability in JL nanowire compared to the inversion-mode (IM) nanowire at `on´ state stress condition. Then we present the impact of `off´ state stress in the JL nanowire, considering that a high gate oxide field is applied at the `off´ state. Additionally, the improved sub-threshold swing (SS) after HC stress in some JL nanowires is discussed.
Keywords :
"Degradation","Logic gates","Stress","Junctions","Interface states","Hot carriers"
Conference_Titel :
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN :
2156-017X
DOI :
10.1109/IEDM.2015.7409697