Title :
Transport mechanism in sub 100?C processed high mobility polycrystalline ZnO transparent thin film transistors
Author :
P. B. Pillai;M. M. De Souza
Author_Institution :
Department of EEE, University of Sheffield, S1 3JD, Sheffield, UK
Abstract :
We demonstrate high performance ZnO TFTs with record field effect mobility 229 cm2/V.s, on/off ratio exceeding 107 (limited only by our simple device structure) and sub threshold swing (S) <;150 mV/dec, surpassing the performance of many reported amorphous Indium Gallium Zinc Oxide (a-IGZO) thin film transistors.1,2 The tail state distribution of the density of states (DOS) in ZnO extracted via 2D numerical simulations matched to experiment, demonstrates unequivocally a similar mobility mechanism that underpins all Transparent Conducting Oxides (TCOs)-whether amorphous or not. The characteristic Temperature of ZnO is found to be ~463 K and the tail state density of states (DOS) is ~1.3 ×1020cm-3eV-1.
Keywords :
"Zinc oxide","II-VI semiconductor materials","Thin film transistors","Performance evaluation","Logic gates","Electron traps"
Conference_Titel :
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN :
2156-017X
DOI :
10.1109/IEDM.2015.7409785