Title :
High-density optrode-electrode neural probe using SixNy photonics for in vivo optogenetics
Author :
Luis Hoffman;Marleen Welkenhuysen;Alexandra Andrei;Silke Musa;Zhenxiang Luo;Sarah Libbrecht;Simone Severi;Philippe Soussan;Veerle Baekelandt;Sebastian Haesler;Georges Gielen;Robert Puers;Dries Braeken
Author_Institution :
IMEC, Kapeldreef 75, 3001 Leuven, Belgium
Abstract :
Moore s law in neural sciences: we present an optical neural probe (optoprobe) with the highest integration density of optrodes-electrodes using a CMOS process platform in 193 nm lithography. We designed, developed, and packaged an ultrathin (30 μm) optical neural probe, co-integrating silicon nitride (SixNy) photonics and biocompatible titanium nitride (TiN) electrodes (1). Functionality was verified in vivo by optically evoking and electrically recording neuronal activity in a mouse brain. Our design takes advantage of CMOS technology and incorporates 12 miniaturized optical outputs (optrodes) placed symmetrically next to 24 recording electrodes on a narrow 100-μm wide shank. We achieved an unprecedented optrode density by integrating grating couplers (GCs) instead of traditional end-butt coupling. The size of each optrode and electrode is 6 × 20 μm2 and 10 × 10 μm2 respectively, which is the typical size of a neuron. The system was capable of local excitation and recording of transduced neurons, a breakthrough achieved by the high-density integration.
Keywords :
"Gratings","Optical device fabrication","Diode lasers","Probes","Silicon","Electrodes","Neurons"
Conference_Titel :
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN :
2156-017X
DOI :
10.1109/IEDM.2015.7409795