Attributes of an advanced node cu-barrier slurry

Next generation barrier slurries are required to achieve greater flexibility in materials polished, and tighter process control with improved defectivity and overall cost of ownership. The results of this work demonstrate that chemical additives can be used to increase the efficiency of the mechanical abrasive component of barrier slurries, leading to higher removal rates, improved selectivities, better topographic control, and reduced defects. Air Products´ diverse product offerings in advanced IC integration materials space enables a greater understanding of interactions of chemistry, materials, and integration manufacturing technology, and development of the highest value barrier slurry offerings.