• DocumentCode
    3749881
  • Title

    Single-molecule spectroscopic analysis of adsorption phenomena on colloidal silica abrasives used in chemical-mechanical planarization slurries

  • Author

    Lauren M. Jacobson;Donald K. Schorr;Edward E. Remsen;Colin T. Carver;Ashwani K. Rawat;Mansour Moinpour

  • Author_Institution
    Mund-Lagowski Department of Chemistry and Biochemistry, Bradley University, Peoria, IL 61625, USA
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    Advances in the use of a single-molecule spectroscopic method, fluorescence correlation spectroscopy (FCS), for the determination of the particle size distribution (PSD) of fine dispersions of colloidal silica and ceria abrasive particles employed in CMP slurries are described. The Maximum Entropy Method (MEM) is shown to be an effective approach for PSD analysis using FCS data for fluorescently dyed abrasive particles. FCS also provides an analysis of absorption phenomena on CMP abrasive particles using a fluorescent dye for the quantitative determination of adsorption isotherms. Extension of the FCS technique to the characterization of the adsorption of CMP slurry additive to colloidal silica and ceria abrasives is proposed.
  • Keywords
    "Solids","Atmospheric measurements","Particle measurements","Chemicals"
  • Publisher
    ieee
  • Conference_Titel
    Planarization/CMP Technology (ICPT), 2015 International Conference on
  • Type

    conf

  • Filename
    7411979