• DocumentCode
    3749910
  • Title

    Ellipsometric measurement of particle-spiked wafer surfaces

  • Author

    Eiichi Kondoh;Hayato Kotagiri;Mitsuhiro Watanabe;Satomi Hamada;Shohei Shima;Hirokuni Hiyama

  • Author_Institution
    University of Yamanashi, Takeda 4, Kofu, 4008511, Japan
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    This paper studied the ability of ellipsometry for quantitative evaluation of particle contamination. Very good correlation between the ellipsometric measurement and the bead amount was confirmed. This technique can be employed for quick evaluation of wafer cleaning at laboratories.
  • Keywords
    "Atom optics","Optical films","Optical imaging","Optical scattering","Optical sensors","Microscopy"
  • Publisher
    ieee
  • Conference_Titel
    Planarization/CMP Technology (ICPT), 2015 International Conference on
  • Type

    conf

  • Filename
    7412008
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3749910